Description
NT12000 V1 SPECIFICATIONS
- RPM Range: 50 – 12000
- Acceleration capability: 8000rpm/sec (0-12000 in 1.5 seconds)
- Program storage facility: Store the programs internally or externally (Internal
- Memory 16 GB, External Memory a Pen Drive)
- Number of steps: 10
- Total duration of a complete program (with ‘n’ number of steps): 1000
seconds - Accuracy: <+- 1% rpm
- Chuck accommodation: Vacuum Less Groove type to fit in 5 types of
substrates 4 inch dia, 3 inch dia, 2 inch dia silicon wafers, Microscopic glass
slide and Cover Slip - Vacuum based chucks – customization according to the user requirement
NT12000 V1 FEATURES
- Touch screen to ease data feeding/programming
- Hybrid spin coater which can be used both with Vacuum and Vacuum less,
and hence ensures uninterrupted spin coating operation. - Enhanced vibration damping to prevent cracks and undesirable effects on
the thin film so formed - High acceleration to explore and achieve new results
- High stability of run (i.e less oscillation from the SET RPM) & LIVE RPM
